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1.4nm single-patterned processes need High NA, says imec

Monday, May 11, 20262 min read12h ago
1.4nm single-patterned processes need High NA, says imec

To avoid the need for multi-patterning in  1.4nm and 1nm processes, High-NA EUV will be needed, says imec. ‘For A14 and A10 logic nodes, requirements for

To avoid the need for multi-patterning in  1.4nm and 1nm processes, High-NA EUV will be needed, says imec. ‘For A14 and A10 logic nodes, requirements for ‘For A14 and A10 logic nodes, requirements for the most critical metal layers (i.e., M0 and M2) are very demanding,’ says imec, ‘lines/spaces with ≤20nm pitches, aggressive tip-to-tip (T2T) structures to interrupt the lines (T2Ts with ≤15nm CD and ≤3... [1744 chars] Originally reported by Electronics Weekly. Read the full story at the original source for complete details and analysis.
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